Introduction to the job
ASML/Brion brings together the most creative minds in science and technology to develop computational lithography software to enable customers on the best process window enhancement solution for the next generation HighNA EUV scanner, as well as best process window control solution to mitigate the process variation during the scanner operation, providing holistic solution for advanced nodes in semi-conductor industries.
Role and responsibilities
- Feasibility study of advanced imaging for ASML scanner application, including study the imaging impact with illumination, mask correction, aberration, overlay and mirror/lens heating.
- Design software component to support customer's request on process window enhancement and process window control for ASML scanner application
- Perform qualification test, lead wafer validation and generate proof data, provide training slides, user guide and other technical documents.
- Work with local application engineer to support customer activity, promoting ASML scanner and application adoption.
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Education and experience
- Pursuing PhD., or Master's degree in Optics, EE/ME, Physic with experience in optical design, lithography, semiconductor/EDA industry
- Solid understanding of Fourier Optics Imaging and Abbe/Hopkin Imaging Theory
- Knowledge/hands-on experience with Simulation software/technical tools (i.e. Python, Matlab, etc.)
- Experience with rigorous optical simulation is a plus (FDTD, RCWA)
- Soft skill requirements (i.e. strong English communication skills - both written and oral, ability to influence, etc.).
- knowledge of data analytics and machine learning.
- Knowledge in optimization theory, including Convex optimization theory and gradient based optimization .
Skills
- Knowledge/hands-on experience with simulation software/technical tools (i.e. python, matlab, etc.)
- Soft skill requirements (i.e. strong English communication skills - both written and oral, ability to influence, etc.).
- knowledge of data analytics and machine learning.
- Solid understanding of imaging theories (Abbe, Hopkins).
- Direct or indirect experience in OPC (Optical Proximity Correction), including rigorous lithography simulation (Hyperlith, Prolith), RET, and advanced mask technology.
- Experience in lithography or related fields.
- Knowledge in EUV lithography and challenges.
- Knowledge in optimization methods
Diversity and inclusion
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.
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Request an Accommodation
ASML provides reasonable accommodations to applicants for ASML employment and ASML employees with disabilities. An accommodation is a change in work rules, facilities, or conditions which enable an individual with a disability to apply for a job, perform the essential functions of a job, and/or enjoy equal access to the benefits and privileges of employment. If you are in need of an accommodation to complete an application, participate in an interview, or otherwise participate in the employee pre-selection process, please send an email to USHRServiceCenter@asml.com to initiate the company's reasonable accommodation process.
Please note: This email address is solely intended to provide a method for applicants to initiate ASML's process to request accommodation(s). Any recruitment questions should be directed to the designated Talent Acquisition member for the position.
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